发明名称 |
MOLD FOR IMPRINTING, SUBSTRATE FOR MAKING PATTERNED MEDIUM AND PATTERNED MEDIUM, AND METHOD FOR MANUFACTURING THESE |
摘要 |
PROBLEM TO BE SOLVED: To solve such a new problem that, when manufacturing a mold for imprinting by forming a silicon-containing patterning film on a glass substrate containing an alkali metal, the alkali metal precipitates on a surface of a concave-convex pattern.SOLUTION: A method for manufacturing a mold for imprinting includes: a first step of successively forming a patterning film 3, a hard mask film 4 and a resist film 5 on a glass substrate 1 containing an alkali metal, and then forming a resist pattern 5a; and a second step of etching the hard mask film 4 and the patterning film 3 by using the resist pattern 5a so as to form a concavo-convex pattern on the surface of the patterning film 3. In the first step, a precipitation suppressing film 2 is formed between the glass substrate 1 and the patterning film 3 so as to prevent the alkali metal included in the glass substrate 1 from diffusing from the glass substrate 1 to the patterning film 3 to precipitate on the surface of the patterning film 3. |
申请公布号 |
JP2014240127(A) |
申请公布日期 |
2014.12.25 |
申请号 |
JP20130122599 |
申请日期 |
2013.06.11 |
申请人 |
HOYA CORP |
发明人 |
SATO TAKASHI;TANIGUCHI KAZUTAKE;KISHIMOTO SHUJI |
分类号 |
B29C59/02;G11B5/65;G11B5/84;H01L21/027 |
主分类号 |
B29C59/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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