| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron beam hologram forming device capable of coping with a screening phenomenon and an electron beam hologram forming method. <P>SOLUTION: The electron beam hologram forming device is provided with a first electrode and a second electrode for impressing voltage on a sample. In the electron beam hologram forming method, electron beams are irradiated on the sample in a state the voltage is impressed on the sample to form the electron beam hologram. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
