| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique that is advantageous in terms of accuracy of positioning of a stage that holds a substrate. SOLUTION: An imprint apparatus that transfers a pattern onto a substrate by curing a resin on the substrate under a situation, in which the resin and a mold contact each other, and removing the mold from the cured resin, comprises: a first stage that holds and moves the substrate; a first plate member that is arranged so as to surround the substrate held by the first stage; a second stage that is constructed as a body separated from the first stage and holds and moves the first plate member; a gas mechanism including a supply port, which supplies gas to a space between the mold, the substrate, and the first plate member, and a recovery port that recovers the gas supplied to the space; and a control part for controlling the first stage and the second stage so that the second stage moves to follow the movement of the first stage. COPYRIGHT: (C)2012,JPO&INPIT |
