发明名称 DEPOSITION SLUDGE PHYSICAL AND CHEMICAL CLEANING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for efficiently removing deposition sludge deposited on a facility and an appliance such as a steam generator, a boiler, and a heat exchanger used in a nuclear plant.SOLUTION: Treatment target materials are immersed in a cleaning liquid containing at least one kind selected from NH, ETA (mono-ethanol-amine) and NH. Then, temperature and pressure of the cleaning liquid is changed for generating bubbles in the cleaning liquid. In addition, for promoting removal of sludge, temperature of the cleaning liquid is increased. An ETA or NHamount in the cleaning liquid is adjusted so that pH of the cleaning liquid is 7.5-9.5, and concentration of NHin the cleaning liquid is 20 ppb-0.1%.</p>
申请公布号 JP2014238412(A) 申请公布日期 2014.12.18
申请号 JP20140152760 申请日期 2014.07.28
申请人 SOONCHUNHYANG UNIV INDUSTRY ACADEMY COOPERATION FOUNDATION 发明人 LEE IN-HYUN;PARK BYUNG-GI;AHN HYUNG-KYUNG;GWON HYUK-JUN;SONG CHANG-HO;JUNG HYUN JUN
分类号 G21F9/28;G21F9/06 主分类号 G21F9/28
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