PREPARING METHOD OF INORGANIC THIN FILM, AND APPARATUS THEREFOR

摘要

The present invention relates to a method and apparatus for manufacturing an inorganic thin film. The method for manufacturing the inorganic thin film according to the embodiment of the present invention includes the steps of: alternatively processing a base material with plasma using a silicon source and a reactive gas; and forming the inorganic thin film on the base material by reacting the surface of the base material to the silicon source and the reactive gas. The silicon source includes a silicon precursor and an inert gas.