发明名称 SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
摘要 A material of topmost layers (14b, 15b) of a source electrode (14) and a drain electrode (15) of an organic TFT (1) has a smaller work function difference between the material and a material of a semiconductor layer (16) than a work function difference between the material of the semiconductor layer and a material of layers (14a, 14b) other than the topmost layers. Upper surfaces and side surfaces of the topmost layers of the source electrode (14) and the drain electrode (15) are directly in contact with the semiconductor layer (16), and there is a second gate insulating layer (12) between the layers other than the topmost layers and the semiconductor layer (16).
申请公布号 WO2014199672(A1) 申请公布日期 2014.12.18
申请号 WO2014JP55029 申请日期 2014.02.28
申请人 SHARP KABUSHIKI KAISHA 发明人 SUGA, KATSUYUKI
分类号 H01L29/786;H01L21/28;H01L21/336;H01L29/41;H01L51/05 主分类号 H01L29/786
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