发明名称 TWO-STAGE LASER SYSTEM FOR ALIGNERS
摘要 The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
申请公布号 US2014369373(A1) 申请公布日期 2014.12.18
申请号 US201414245371 申请日期 2014.04.04
申请人 WAKABAYASHI Osamu;ARIGA Tatsuya;KUMAZAKI Takahito;SASANO Kotaro 发明人 WAKABAYASHI Osamu;ARIGA Tatsuya;KUMAZAKI Takahito;SASANO Kotaro
分类号 H01S3/23;H01S3/083 主分类号 H01S3/23
代理机构 代理人
主权项
地址 Hiratsuka-shi JP