发明名称 EXTENDED GATE SENSOR FOR pH SENSING
摘要 A sensing device includes a substrate having a source region and a drain region formed therein. A gate structure is formed over the substrate and includes a gate dielectric and a gate conductor. The gate conductor is formed on the gate dielectric and disposed between the source region and the drain region. A dielectric layer is formed over the substrate and has a depth configured to form a well over the gate conductor. A gate extension is formed in contact with or as part of the gate conductor and including a conductive material covering one or more surfaces of the well.
申请公布号 US2014367748(A1) 申请公布日期 2014.12.18
申请号 US201313918272 申请日期 2013.06.14
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 Dalton Timothy J.;Jagtiani Ashish V.;Muralidhar Ramachandran;Zafar Sufi
分类号 G01N27/414 主分类号 G01N27/414
代理机构 代理人
主权项 1. A sensing device, comprising: a substrate having a source region and a drain region formed therein; a gate structure formed over the substrate and including a gate dielectric and a gate conductor, the gate conductor being formed on the gate dielectric and disposed between the source region and the drain region; a dielectric layer formed over the substrate and having a depth configured to form a well over the gate conductor; and a gate extension formed in contact with or part of the gate conductor and including a conductive material exposed on one or more surfaces of the well.
地址 Armonk NY US