发明名称 |
EXTENDED GATE SENSOR FOR pH SENSING |
摘要 |
A sensing device includes a substrate having a source region and a drain region formed therein. A gate structure is formed over the substrate and includes a gate dielectric and a gate conductor. The gate conductor is formed on the gate dielectric and disposed between the source region and the drain region. A dielectric layer is formed over the substrate and has a depth configured to form a well over the gate conductor. A gate extension is formed in contact with or as part of the gate conductor and including a conductive material covering one or more surfaces of the well. |
申请公布号 |
US2014367748(A1) |
申请公布日期 |
2014.12.18 |
申请号 |
US201313918272 |
申请日期 |
2013.06.14 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
Dalton Timothy J.;Jagtiani Ashish V.;Muralidhar Ramachandran;Zafar Sufi |
分类号 |
G01N27/414 |
主分类号 |
G01N27/414 |
代理机构 |
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代理人 |
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主权项 |
1. A sensing device, comprising:
a substrate having a source region and a drain region formed therein; a gate structure formed over the substrate and including a gate dielectric and a gate conductor, the gate conductor being formed on the gate dielectric and disposed between the source region and the drain region; a dielectric layer formed over the substrate and having a depth configured to form a well over the gate conductor; and a gate extension formed in contact with or part of the gate conductor and including a conductive material exposed on one or more surfaces of the well. |
地址 |
Armonk NY US |