发明名称 STRUCTURES FOR RESISTANCE RANDOM ACCESS MEMORY AND METHODS OF FORMING THE SAME
摘要 Memory cells and methods of forming the same and devices including the same. The memory cells have first and second electrodes. An amorphous semiconductor material capable of electronic switching and having a first band gap is between the first and second electrodes. A material is in contact with the semiconductor material and having a second band gap, the second band gap greater than the first band gap.
申请公布号 US2014369107(A1) 申请公布日期 2014.12.18
申请号 US201414471569 申请日期 2014.08.28
申请人 MICRON TECHNOLOGY, INC. 发明人 Mouli Chandra;Meade Roy
分类号 H01L45/00;G11C13/00 主分类号 H01L45/00
代理机构 代理人
主权项
地址 Boise ID US