| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of manufacturing a substrate for a liquid discharge head that can suppress tilting without lowering productivity.SOLUTION: There is provided the method of manufacturing a substrate for a liquid discharge head that includes a process of forming a liquid supply port penetrating a silicon substrate by dry etching, and the process sequentially repeats: a process (1) of forming an etching protective film on the silicon substrate, a process (2) of removing an etching protective film at a bottom part from the etching protective film, and a process (3) of etching the silicon substrate, a sheath formed in the process (2) being thicker than a sheath formed in the process (3).</p> |
