发明名称 |
CRUCIBLE FOR VAPOR DEPOSITION, VAPOR DEPOSITION DEVICE, AND VAPOR DEPOSITION METHOD |
摘要 |
Provided are a crucible for vapor deposition, a vapor deposition apparatus and a vapor deposition method capable of detecting a film formation rate using a sensor in vapor deposition by proximity vapor deposition. The crucible according to the present invention includes a storage section that stores a vapor deposition source, a first guide passage that guides a vaporized material emitted from the vapor deposition source toward a substrate to be treated, a wall section for defining the first guide passage and a second guide passage that diverges from a middle part of the first guide passage, penetrates the wall section and communicates with the outside. |
申请公布号 |
EP2813597(A1) |
申请公布日期 |
2014.12.17 |
申请号 |
EP20120868093 |
申请日期 |
2012.09.11 |
申请人 |
NITTO DENKO CORPORATION |
发明人 |
KAKIUCHI, RYOHEI;YAMAMOTO, SATORU |
分类号 |
C23C14/24;C23C14/54;H01L51/50;H05B33/10 |
主分类号 |
C23C14/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|