发明名称 GAS SUPPLY DEVICE
摘要 In a gas supply device (11), a tank (21) that stores LNG (12) is provided with a supply path (13) that is used to supply vaporized gas to gas consumption equipment (13) and a reflux path (41) that is used to reflux the vaporized gas, guided out from an inner heat-blocking chamber (25), to the tank (21) ; and pressure adjustment means (42) provided in the reflux path (41) adjusts an inner pressure of the tank (21) to supply gas via the supply path (31). In the tank (21) of the gas supply device (11), the inner heat-blocking chamber (25) that is partitioned from a liquefied gas storage section (24) that stores the LNG (12) by a vacuum heat-insulating layer (22a) is provided. In the liquefied gas storage section (24), a guide-out path (26) that is used to guide the LNG into the inner heat-blocking chamber (25) is formed. An upstream part of the reflux path (41) is provided in the tank (21) . In the inner heat-blocking chamber (25), a heat exchange section (27) that uses gas as a heating medium to vaporize the LNG (12) is provided. A liquid phase part is accommodated in the tank (21).
申请公布号 EP2813746(A1) 申请公布日期 2014.12.17
申请号 EP20130746900 申请日期 2013.02.06
申请人 IWATANI CORPORATION;ATEC CO., LTD.;MITSUBISHI HEAVY INDUSTRIES, LTD. 发明人 KUSAKA HIROYUKI;TAKATA TAKAYOSHI;TAKAO KAZUHIRO;GOTO KATSUHIKO;SHIBUYA TOSHIKI;YAMADA DAISUKE
分类号 B63J99/00;F17C7/02;F17C7/04 主分类号 B63J99/00
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