| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of suppressing formation of a bubble stripe and then depositing a film with superior film thickness uniformity.SOLUTION: A film deposition apparatus films a material to be filmed with a film by using a chemical bath deposition method. The film deposition apparatus includes: a reaction tank in which a reaction solution is reserved and the material to be filmed is dipped in the reaction solution so as to film the film to be filmed with the film; a supply pipe which is provided at a lower part of the reaction tank and supplies the reaction solution into the reaction tank; a supply part which supplies the reaction solution; and a bubble removal part which is provided at the other end of the supply pipe and removes bubbles from the reaction liquid. The supply pipe has a hole formed so as to supply the reaction solution into the reaction tank. |
