| 发明名称 |
METHOD FOR FABRICATING LIQUID CRYSTAL DISPLAY |
| 摘要 |
Method for manufacturing a thin film transistor liquid crystal display is provided. A substrate is provided. A gate electrode, a source electrode, a drain electrode, and a passivation film are formed on the substrate in sequence. The passivation film has a contact hole to expose a part of the drain electrode. A conductive layer is formed by coating nano metal material on the passivation film and in the contract hole from which the drain electrode is exposed. A pixel electrode is formed by patterning the conductive layer. |
| 申请公布号 |
US2014363914(A1) |
申请公布日期 |
2014.12.11 |
| 申请号 |
US201414297601 |
申请日期 |
2014.06.05 |
| 申请人 |
Ye Xin Technology Consulting Co., Ltd. |
发明人 |
KAO YI-CHUN |
| 分类号 |
H01L27/12;H01L21/28 |
主分类号 |
H01L27/12 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for fabricating a thin film transistor (TFT) liquid crystal display, the method comprising:
providing a substrate; forming a gate electrode, a source electrode, a drain electrode, and a passivation film on the substrate in sequence, the passivation film having a contact hole to expose a part of the drain electrode; forming a conductive layer by coating nano metal material on the passivation film and the part of the drain electrode exposed from the contract hole; and forming a pixel electrode by patterning the conductive layer. |
| 地址 |
Hsinchu TW |
