发明名称 PROTECTIVE MATERIAL FOR SOLAR CELLS
摘要 The present invention achieves a solar cell protective material containing a moisture-resistant film with a moisture vapor permeability of less than 0.1 g/m2/day, but not decreasing the moisture resistance for a long term, preventing delamination, and having excellent flexibility and excellent moisture resistance. The present invention provides a solar cell protective material having an effect in preventing the performance degradation of a solar cell and improving the durability of a solar cell. The solar cell protective material includes a fluorine-based resin film; a pressure sensitive adhesive layer; and a moisture-resistant film having a base material and an inorganic layer on at least one side of the base material, the moisture-resistant film having a moisture vapor permeability of less than 0.1 g/m2/day, in which the fluorine-based resin film, the pressure sensitive adhesive layer, and the moisture-resistant film are laminated as a protective material-forming layer P, and the ratio (WP/WA) of the maximum width WP of the protective material-forming layer P other than the fluorine-based resin film to the width WA of the fluorine-based resin film is less than 1.
申请公布号 US2014360581(A1) 申请公布日期 2014.12.11
申请号 US201214368907 申请日期 2012.12.27
申请人 MITSUBISHI PLASTICS, INC. 发明人 Ninomiya Naoya;Aya Tetsuya;Akaike Osamu;Kudou Hirofumi;Mitsukura Yumi
分类号 H01L31/048;H01L31/18 主分类号 H01L31/048
代理机构 代理人
主权项 1. A solar cell protective material comprising: a fluorine-based resin film, a pressure sensitive adhesive layer, and a moisture-resistant film, wherein said moisture-resistant film comprises a base material and an inorganic layer on at least one side of the base material, and said moisture-resistant film has a moisture vapor permeability of less than 0.1 g/m2/day, and the fluorine-based resin film, the pressure sensitive adhesive layer, and the moisture-resistant film are laminated as a protective material-forming layer P, and the ratio (WP/WA) of the maximum width WP of the pressure sensitive adhesive layer and the moisture-resistant film to the width WA of the fluorine-based resin film is less than 1.
地址 Chiyoda-ku, Tokyo JP