ISOLATION STRUCTURE AND METHOD FOR FABRICATING THE SAME, IMAGE SENSOR HAVING ISOLATION STRUCTURE

摘要

The present technology relates to a device isolation structure capable of separating a plurality of device regions and preventing interference between adjacent device regions. Provided is the device isolation structure which includes a first device isolation part which includes an insulation layer to gap-fill a trench which is formed on a substrate and a second device isolation part which includes a first impurity region which is formed on the substrate and a second impurity region which is formed along the edge of the first impurity region and has a doping concentration which is larger than the doping concentration of the first impurity region. Wherein, the first device isolation part and the second device isolation part are stacked.