发明名称 METHOD AND DEVICE FOR FORMING PROTRUSION BY MASKING ON SURFACE OF BASIC MATERIAL
摘要 The present invention relates to a method and a device for forming a protrusion by masking and, more specifically, to a method for forming a protrusion by masking, comprising: a mask formation step for forming a mask layer on a basic material; an etching step for etching an area in which a mask is not formed on the basic material; and a mask removal step for removing the mask layer, wherein the mask formation step comprises: a step for forming at least one small mask; and a step for forming at least one big mask.
申请公布号 WO2014196694(A1) 申请公布日期 2014.12.11
申请号 WO2013KR08036 申请日期 2013.09.05
申请人 SEP, INC. 发明人 LEE, SANG RO;RHA, JONG JOO;PARK, MYUNG JUM;KIM, MYOUNG GEUN;KIM, YUN HWAN;SEO, JAE HYUNG;YUE, XIN;LEE, JI YOUNG
分类号 C23C14/04;C23C14/34;C23C16/04;C23C16/44 主分类号 C23C14/04
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