| 主权项 |
1. A photoresist underlayer film-forming composition for use in lithography, comprising a novolak resin comprising recurring units having the general formula (1):wherein R1 is hydrogen, an acid labile group, glycidyl group, or a straight, branched or cyclic C1-C10 alkyl, acyl or alkoxycarbonyl,
R2 is hydrogen, or a straight, branched or cyclic C1-C10 alkyl, C2-C10 alkenyl, or C6-C10 aryl group, which may have a hydroxyl, alkoxy, acyloxy, ether, sulfide or halogen moiety, or a halogen atom, hydroxyl, acyl, carboxyl, acyloxy, alkoxycarbonyl, cyano or C1-C4 alkoxy group, R3 is hydrogen, or a straight, branched or cyclic C1-C6 alkyl, a straight, branched or cyclic C2-C10 alkenyl, or C6-C12 aryl group, which may have a hydroxyl, alkoxy, ether, thioether, carboxyl, alkoxycarbonyl, acyloxy, —COOR or —OR moiety, wherein R is a lactone ring, acid labile group, or —R′—COOR″, wherein R′ is a single bond or alkylene group, and R″ is an acid labile group, X is methylene, ethylene, ethynylene, —S— or —NH—, each of m and n is 1 or 2. |
