| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition exhibiting an excellent balance between chemical resistance and other characteristics demanded for a photosensitive resin composition, and to provide an electronic device having the photosensitive resin composition.SOLUTION: The photosensitive resin composition comprises a polymer (first polymer) expressed by formula (1) shown below, a first crosslinking agent that crosslinks with the polymer, an acrylic resin as a second crosslinking agent having a reactive group that crosslinks with the polymer or the first crosslinking agent, and a photosensitizer. In formula (1), R, R, Rand Reach independently represent hydrogen or an organic group having 1 to 30 carbon atoms; and A represents a structural unit derived from maleic acid anhydride. |
