发明名称 Method for imaging a sample in a dual-beam charged particle apparatus
摘要 <p>The invention relates to a dual beam apparatus equipped with an ion beam column (102) and an electron beam column (101), the electron beam column comprising an electrostatic immersion lens (116). When tilting the sample (104), the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as transverse chromatic aberration and beam displacement. Also in-column detectors (141), detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample. The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced.</p>
申请公布号 EP2811506(A1) 申请公布日期 2014.12.10
申请号 EP20130170553 申请日期 2013.06.05
申请人 FEI COMPANY 发明人 SED'A, BOHUSLAV;TUMA, LUBOMÍR;PETR, HLAVENKA;SYTAR, PETR
分类号 H01J37/147 主分类号 H01J37/147
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