发明名称 インプリント装置、インプリント方法およびデバイス製造方法
摘要 <p>An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.</p>
申请公布号 JP5637931(B2) 申请公布日期 2014.12.10
申请号 JP20110110587 申请日期 2011.05.17
申请人 キヤノン株式会社 发明人 前田 普教;三浦 聖也;三島 和彦;箕田 賢
分类号 H01L21/027;B29C59/02;G03F7/20;G03F9/00 主分类号 H01L21/027
代理机构 代理人
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