发明名称 半導体メモリ装置
摘要 <p>A matrix is formed using a plurality of memory cells in each of which a drain of the writing transistor is connected to a gate of a reading transistor and one electrode of a capacitor. A gate of the writing transistor, a source of the writing transistor, a source of the reading transistor, and a drain of the reading transistor are connected to a writing word line, a writing bit line, a reading bit line, and a bias line, respectively. The other electrode of the capacitor is connected to a reading word line. In order to decrease the number of wirings, the writing bit line is substituted for the reading bit line. The reading bit line is formed so as to be embedded in a groove-like opening formed over a substrate.</p>
申请公布号 JP5639921(B2) 申请公布日期 2014.12.10
申请号 JP20110033241 申请日期 2011.02.18
申请人 发明人
分类号 H01L21/8242;H01L21/336;H01L21/8247;H01L27/108;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8242
代理机构 代理人
主权项
地址