| 摘要 |
<p>Disclosed is a method for manufacturing a composite thin film. According to a preferred embodiment of the present invention, a subject on which a composite thin film is to be formed is pre-processed, and vacuum metalizing is executed on aluminum and titanium which are the subjects. The vacuum metallizing is executed on silicon which is the target. According to the present invention, a composite thin film with ultra high hardness equal to or greater than 40 GPa may be formed to be used in processing, such as coating, a metal surface, thereby enabling the surface-processed metal to have excellent properties such as high-temperature strength, softening resistance, toughness, and the like.</p> |
