发明名称 Multifunctional electrode
摘要 A nonvolatile memory element is disclosed comprising a first electrode, a near-stoichiometric metal oxide memory layer having bistable resistance, and a second electrode in contact with the near-stoichiometric metal oxide memory layer. At least one electrode is a resistive electrode comprising a sub-stoichiometric transition metal nitride or oxynitride, and has a resistivity between 0.1 and 10 Ωcm. The resistive electrode provides the functionality of an embedded current-limiting resistor and also serves as a source and sink of oxygen vacancies for setting and resetting the resistance state of the metal oxide layer. Novel fabrication methods for the second electrode are also disclosed.
申请公布号 US8906736(B1) 申请公布日期 2014.12.09
申请号 US201414479565 申请日期 2014.09.08
申请人 Intermolecular, Inc.;Kabushiki Kaisha Toshiba;SanDisk 3D LLC 发明人 Pham Hieu;Gopal Vidyut;Hashim Imran;Minvielle Tim;Pramanik Dipankar;Wang Yun;Yamaguchi Takeshi;Yang Hong Sheng
分类号 H01L29/02 主分类号 H01L29/02
代理机构 代理人
主权项 1. A method, comprising: forming a first layer on a surface of a substrate, wherein the first layer comprises a sub-stoichiometric nitride or a sub-stoichiometric oxynitride, wherein the first layer is formed by reactive sputtering in an atmosphere comprising nitrogen, and wherein a sputter gun used to form the first layer is positioned at an angle of between about 55° and about 85° relative to a normal to the surface of the substrate.
地址 San Jose CA US