发明名称 |
DEVICE FOR DETERMINING THE TEMPERATURE OF A SUBSTRATE |
摘要 |
<p>An apparatus and a method for determining the temperature of a substrate, in particular of a semiconductor substrate during the heating thereof by means of at least one first radiation source are disclosed. A determination of the temperature is based on detecting first and second radiations, each comprising radiation emitted by the substrate due to its own temperature and radiation emitted by the first radiation, which is reflected at the substrate and at least one of a drive power of the first radiation source and the radiation intensity of the first radiation source.</p> |
申请公布号 |
KR20140140081(A) |
申请公布日期 |
2014.12.08 |
申请号 |
KR20147029081 |
申请日期 |
2013.03.15 |
申请人 |
CENTROTHERM THERMAL SOLUTIONS GMBH + CO. KG;HQ-DIELECTRICS GMBH |
发明人 |
RICK HARTMUT;LERCH WILFRIED;NIESS JUERGEN |
分类号 |
G01J5/08;G01J5/00;G01J5/02 |
主分类号 |
G01J5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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