SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor element capable of improving reliability, and a method for manufacturing the same.SOLUTION: A method for manufacturing a semiconductor element comprises the steps of: forming a material film on a substrate; performing a selective oxidation step which forms a capping oxide film on a first surface of the material film but does not oxidize a second surface of the material film; and forming a material pattern by etching the material film through the second surface of the material film. When the material film is etched, an etching rate of the capping oxide film is smaller than an etching rate of the material film.