DETECTION DEVICE AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a detection device and a program capable of easily detecting a mask pattern having graphical features identical with or similar to those of a reference pattern registered in a library while suppressing the amount of data in the library.SOLUTION: A detection device 10 detects a mask pattern having graphical features identical with or similar to those of a reference pattern from among a plurality of mask patterns forming a photomask used for manufacture of a semiconductor device. The detection device 10 comprises: an extraction unit 40 for extracting a plurality of graphical feature points from the mask patterns and the reference pattern, respectively; an imparting unit 50 for imparting identification information of a feature point and direction information of a line segment connecting the feature point and an adjacent feature point to each of the feature points extracted by the extraction unit by the mask patterns and the reference pattern; and a detection unit 60 for detecting the mask patterns having graphical features identical with or similar to those of the reference pattern on the basis of the identification information and the direction information that the imparting unit 50 has imparted by the mask patterns and the reference pattern.