| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing device of a work which has a stable polishing speed in polishing a work outer circumferential part and can polish the work highly flatly.SOLUTION: A polishing device 1 of a work W includes: a polishing cloth 4 for polishing the work W; a polishing agent supply mechanism 7 for supplying a polishing agent; and a polishing head 2 for retaining the work W. Therein, in the polishing head 2, a back surface of the work W is retained by a backing pad 5, an edge part of the work W is retained by an annular template 6, and the work W and the template 6 are pressed onto the polishing cloth 4, thereby, the work W is brought into sliding contact with the polishing cloth 4 and the work W is polished. The template 6 is made of resin to which filler is added or resin in which woven fabrics are contained, and the filler or woven fabrics are exposed on the surface which presses the polishing cloth 4. Thus, the surface which presses the polishing cloth 4 has fine recessed parts. |
