发明名称 ORGANIC MOLECULAR FILM FORMING APPARATUS AND ORGANIC MOLECULAR FILM FORMING METHOD
摘要 An organic molecular film forming apparatus 100 of forming an organic molecular film on a processing target object includes a processing chamber 11 that accommodates therein the processing target object; an organic material gas supplying unit 2 that supplies an organic material gas into the processing chamber 11; and an ultraviolet ray irradiating unit 13 that irradiates ultraviolet ray to at least one of the processing target object, the organic material gas supplied to the processing target object, and a film formed on a surface of the processing target object. At least one of the surface of the processing target object and the organic molecular film formed thereon is activated by irradiating the ultraviolet ray from the ultraviolet ray irradiating unit 13 to at least one of the processing target object, the organic material gas supplied to the processing target object, and the film formed on the processing target object.
申请公布号 US2014357016(A1) 申请公布日期 2014.12.04
申请号 US201414291164 申请日期 2014.05.30
申请人 Tokyo Electron Limited 发明人 Fuse Takashi;Shibuya Setsuko
分类号 H01L51/00;B05C9/12 主分类号 H01L51/00
代理机构 代理人
主权项 1. An organic molecular film forming apparatus that forms an organic molecular film on a processing target object, comprising: a processing chamber configured to accommodate therein the processing target object; an organic material gas supplying unit configured to supply an organic material gas, which contains an organic material, into the processing chamber; and an ultraviolet ray irradiating unit configured to irradiate an ultraviolet ray to at least one of the processing target object, the organic material gas supplied to the processing target object, and a film formed on a surface of the processing target object, wherein at least one of the surface of the processing target object and the organic molecular film formed thereon is activated by irradiating the ultraviolet ray from the ultraviolet ray irradiating unit to at least one of the processing target object, the organic material gas supplied to the processing target object, and the film formed on the surface of the processing target object.
地址 Tokyo JP