| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a plasma processing device and a plasma processing method capable of uniformly radiating high density plasma.SOLUTION: A height adjustment mechanism 4 is provided which is a mechanism for bringing a plasma generation device 3 and a processing object 1 into contact with each other, directly or indirectly without fixing at least one of the plasma processing device 3 and the processing object 1 to keep a gap between them constant, and a universal joint 5 is also provided. Even when the processing object 1 is rolled and pitched by a belt conveyor 2, the gap between the plasma generation device 3 and the processing object 1 can be kept.</p> |
