| 发明名称 |
METHOD FOR PROCESSING A CARRIER AND A CARRIER |
| 摘要 |
A method for processing a carrier may include forming at least one recess structure at least one of over and in the carrier; and annealing the at least one recess structure such that at least one hollow chamber is formed by material of the at least one recess structure, wherein the at least one hollow chamber may form an optical alignment structure. |
| 申请公布号 |
US2014353852(A1) |
申请公布日期 |
2014.12.04 |
| 申请号 |
US201313904122 |
申请日期 |
2013.05.29 |
| 申请人 |
Infineon Technologies Dresden GmbH |
发明人 |
Hauck Tarja;Sciré Alessia;Kaiser Dieter;Greiner Andreas;Nicolo Morgana;Wetzig Carolin;Burmeister Dietrich |
| 分类号 |
H01L23/544 |
主分类号 |
H01L23/544 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for processing a carrier, the method comprising:
forming at least one recess structure at least one of over and in the carrier; annealing the at least one recess structure such that at least one hollow chamber is formed by material of the at least one recess structure, wherein the at least one hollow chamber forms an optical alignment structure. |
| 地址 |
Dresden DE |
