| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a technique advantageous for performing focus measurement of a substrate in an exposure device.SOLUTION: An exposure device for exposing a substrate includes a substrate stage movable while holding the substrate, a measurement section for measuring height of the substrate by irradiating the substrate with light and detecting the light reflected on the substrate, and a control section for controlling the measurement section. The control section acquires a speed profile of the substrate stage, and determines a plurality of timings at which the measurement section performs measurement based on the speed profile, so that a plurality of measurement points on the substrate where measurements are performed by the measurement section have equal intervals in a state where acceleration of the substrate stage is not zero.</p> |
