| 发明名称 |
SUBSTRATE DETERGENT COMPOSITION |
| 摘要 |
The invention provides a substrate detergent composition used for cleaning a surface of a substrate, comprising: (A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 0.4% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. There can be provided a substrate detergent composition used for cleaning a surface of a substrate contaminated with a silicone component whose water contact angle is 100° or more. |
| 申请公布号 |
US2014357052(A1) |
申请公布日期 |
2014.12.04 |
| 申请号 |
US201414276329 |
申请日期 |
2014.05.13 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
UENO Masaya;YANAGISAWA Hideyoshi |
| 分类号 |
C11D7/50;H01L21/762;H01L21/02 |
主分类号 |
C11D7/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate detergent composition used for cleaning a surface of a substrate, comprising:
(A) A quaternary ammonium salt: 0.1 to 2.0% by mass; (B) Water: 0.1 to 0.4% by mass; and (C) An organic solvent: 94.0 to 99.8% by mass. |
| 地址 |
Tokyo JP |
