发明名称 |
FLUORINATED PHOTOPOLYMER WITH INTEGRATED ANTHRACENE SENSITIZER |
摘要 |
A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having an anthracene-based sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent. |
申请公布号 |
US2014356789(A1) |
申请公布日期 |
2014.12.04 |
申请号 |
US201414291767 |
申请日期 |
2014.05.30 |
申请人 |
Orthogonal, Inc. |
发明人 |
Wright Charles Warren;Dammel Ralph Rainer |
分类号 |
G03F7/038;G03F7/42;G03F7/20 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
1. A method of patterning a device comprising:
providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having an anthracene-based sensitizing dye, wherein the photopolymer has a total fluorine content in a range of 15 to 60% by weight; exposing the photopolymer layer to patterned light to form an exposed photopolymer layer; and contacting the exposed photopolymer layer with a developing agent to remove a portion of the exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer, the developing agent comprising at least 50% by volume of a fluorinated solvent. |
地址 |
Rochester NY US |