| 摘要 |
An inductively coupled plasma processing apparatus according to the present invention comprises: a chamber; a source coil arranged on the exterior of a dielectric window outside the chamber; a current transformer connected to the source coil to sense a current value in the source coil; a signal processing unit which receives and processes the current value sensed at the current transformer; and a controller which uses data delivered from the signal processing unit to determine process abnormality inside the chamber. By using the inductively coupled plasma processing apparatus and a control method thereof according to the present invention, a current value variation in the source coil is monitored to sense process abnormality during a process, such that equipment can be effectively and stably maintained. During a maintenance process, a maintenance process can be intensively performed on hardware at a specific position by referring to the data obtained when the abnormalities are occurred. |
