发明名称 複数層化学機械研磨パッド製造方法
摘要 A method for making a multilayer chemical mechanical polishing pad comprising: providing a polishing layer, providing a subpad layer, optionally providing additional layers, providing an unset reactive hot melt adhesive, applying the unset reactive hot melt adhesive in a pattern on a surface of at least one of the layers, applying one of the other layers over the pattern of unset reactive hot melt adhesive, pressing the two layers together with the unset reactive hot melt adhesive interposed therebetween, allowing the unset reactive hot melt adhesive to set forming a reactive hot melt adhesive bond between the two layers.
申请公布号 JP5634687(B2) 申请公布日期 2014.12.03
申请号 JP20090163556 申请日期 2009.07.10
申请人 发明人
分类号 H01L21/304;B24B37/11 主分类号 H01L21/304
代理机构 代理人
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