发明名称 |
Vanadium precursors and their use |
摘要 |
<p>A method for forming a vanadium-containing layer on a substrate, the method comprising at least the steps of:
a) providing a vapor comprising at least one precursor compound according to the invention;
b) reacting the vapor comprising the at least one compound according to the invention with the substrate, according to an atomic layer deposition process, to form a layer of a vanadium-containing complex on at least one surface of said substrate.</p> |
申请公布号 |
EP2808335(A1) |
申请公布日期 |
2014.12.03 |
申请号 |
EP20130305719 |
申请日期 |
2013.05.31 |
申请人 |
L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE |
发明人 |
LACHAUD, CHRISTOPHE;CORREIA - ANACLETO, ANTONY;LAHOOTUN, VANINA;ZAUNER, ANDREAS |
分类号 |
C07F9/00;C23C16/40;C23C16/455 |
主分类号 |
C07F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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