发明名称 露光装置の調整方法、露光方法、露光装置、及びデバイス製造方法
摘要 <p>An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid. The adjusting method comprises: holding a thermometer with the first holder; holding the thermometer with the second holder; and adjusting the temperature of at least one of the first holder and the second holder based on the detection result of the thermometer held by the first holder and the detection result of the thermometer held by the second holder.</p>
申请公布号 JP5633148(B2) 申请公布日期 2014.12.03
申请号 JP20090525403 申请日期 2008.07.29
申请人 发明人
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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