发明名称 Hydrogen selective protective coating, coated article and method
摘要 Hydrogen selective coatings, coated articles and methods for their formation and for hydrogen separation or purification. The coatings are formed by atomic layer deposition of suitable metal oxides with desirable hydrogen activation energy or hydrogen flux, e.g., silicon dioxide, and can be borne on a nonporous, thin-film metal or cermet substrate, e.g., a palladium sheet or layer. The coated substrate may include a porous support for the sheet or layer. The coated article may be used as a purification membrane and the coating can protect the metal layer from contaminants in the gas or process stream from which hydrogen is being purified. In some embodiments, the coated article can provide such protection at elevated temperatures in excess of 300° C.; and in other embodiments, can provide protection at temperatures in excess of 600° C. and even in excess of 800° C.
申请公布号 US8900344(B2) 申请公布日期 2014.12.02
申请号 US201113581587 申请日期 2011.03.21
申请人 T3 Scientific LLC 发明人 Tsai Chung Yi A.;Tam Siu-Yue
分类号 B01D53/22;B01D71/02;C23C16/40;C01B3/50;C23C16/455;B01D67/00 主分类号 B01D53/22
代理机构 Fredrikson & Byron, P.A. 代理人 Fredrikson & Byron, P.A.
主权项 1. A hydrogen selective coated article, comprising: a hydrogen permeable substrate comprised of a nonporous metal layer comprising palladium or a palladium alloy; and an atomic layer deposition deposited hydrogen selective coating on top of the hydrogen permeable substrate having a thickness from about 0.5 nm to about 100 nm, the atomic layer deposition deposited hydrogen selective coating comprising a metal oxide.
地址 Blaine MN US