发明名称 Slurry composition and method of fabricating damascene structure using the same
摘要 A slurry composition has an amount of 100% and includes abrasives, an acid-base pH adjustor, an oxidant and water. A content of the abrasives is 10 wt % to 40 wt %, and a polydisperse index of the abrasives sizes is greater than 1.8. A content of the acid-base pH adjustor is 0.01 wt % to 10 wt %. A content of the oxidant is 0.01 wt % to 10 wt %. A remaining portion of the slurry composition is water.
申请公布号 US8901001(B2) 申请公布日期 2014.12.02
申请号 US200912546688 申请日期 2009.08.25
申请人 UWIZ Technology Co., Ltd. 发明人 Chang Song-Yuan;Tsai Wen-Tsai;Lu Ming-Hui;Shen Po-Yuan
分类号 C09G1/02;H01L21/321;C09K3/14;H01L21/3105 主分类号 C09G1/02
代理机构 Jianq Chyun IP Office 代理人 Jianq Chyun IP Office
主权项 1. A slurry composition, having an amount of 100% and comprising: abrasives, a content thereof being 10 wt % to 40 wt %, and a polydisperse index of abrasives sizes being greater than 1.8; an acid-base pH adjustor, a content thereof being 0.01 wt % to 10 wt %; an oxidant, a content thereof being 0.01 wt % to 10 wt %; a complexing agent capable of increasing a removal rate of a metal when using the slurry composition, a content thereof being 10 ppm to 500 ppm, wherein the complexing agent comprises at least one of citric acid, oxalic acid, ammonium oxalate, tartaric acid, alanine and glycine, and water, wherein a remaining portion of the slurry composition is said water.
地址 Taoyuan County TW