PATTERN REMOVING METHOD, ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING SAME

摘要

The objective of the present invention is to provide: a pattern removing method, which exhibits excellent removing properties and gives less damage to a substrate; a method for manufacturing an electronic device, which comprises the above-described pattern removing method; and an electronic device which is manufactured by the above-described manufacturing method. The present invention comprises: a resist film forming step wherein a resist film is formed by applying an active light sensitive or radiation sensitive resin composition onto a substrate; an exposure step wherein the resist film is exposed; a development step wherein a negative pattern is formed by developing the exposed resist film using a developer liquid that contains an organic solvent; and a removal step wherein the negative pattern is removed using the liquid A or B described below. A: a liquid that contains a sulfoxide compound and/or an amide compound B: a liquid that contains sulfuric acid and hydrogen peroxide