| 摘要 |
FIELD: chemistry.SUBSTANCE: invention relates to the technology of manufacturing semi-conductor devices, to methods of processing quartz equipment, in particular a quartz tube, applied in carrying out high temperature processes in diffuse furnaces. In the method of the quartz tube cleaning the removal of soiling from the quartz tube takes place due to the application of a solution, the composition of which includes ammonium bifluoride NHHFand de-ionised water HO in a ratio of 1:5 at room temperature. The process duration equals to 20±7 minutes. After processing the quartz tube is washed in de-ionised water at room temperature for 20±5 minutes.EFFECT: invention provides the complete removal of different types of soiling from the quartz tube after high-temperature operations, reduction of temperature, duration of the quartz tube processing and reduction of the process cost. |
