| 摘要 |
FIELD: measurement equipment.SUBSTANCE: invention relates to nano-, microelectronics and analytical instrument making industry and can be used for development of technologies and for production of products of micro- and nanoelectronics, as well as for production of pure materials and for diagnostics and control of liquid process media. A method for determining atomic composition of active impurities in liquid media consists in preparation of an analysed object and its arrangement in vacuum. Then, irradiation of surface with a beam of charged particles and recording of secondary particles, as per which composition of surface atoms is determined, is performed. Preparation of the analysed object is performed by preparation of surface of a semiconductor plate by chemical etching, treatment in a peroxide alkali solution and by washing in deionised water. A drop of analysed liquid with the size of at least one micron is applied to the prepared surface of a clean semiconductor plate, then, it is removed, and for the purpose of analysis, the removed drop trace is irradiated with a beam of charged particles.EFFECT: improvement of analysis rapidness, as well as improvement of a detection limit, and namely at least by 10-100 times. |
