发明名称 Amorphous oxide semiconductor layer and thin film transistor having the same
摘要 <p>The present invention relates to an amorphous oxide semiconductor layer that prevents instability caused by light or an electric field, and a thin film transistor that has a channel layer configured to contain the amorphous oxide semiconductor layer. The thin film transistor according to an embodiment of the present invention contains: an amorphous oxide semiconductor material containing oxygen; and a stabilizer additive that prevents the instability caused by light or an electric field by preventing oxygen bonding. In the stabilizer additive, a lone pair s atom forms an electronic band tail in the amorphous oxide so that peroxide formation caused by oxygen bonding is prevented.</p>
申请公布号 KR101466013(B1) 申请公布日期 2014.11.27
申请号 KR20120088372 申请日期 2012.08.13
申请人 发明人
分类号 H01L29/12;H01L29/786 主分类号 H01L29/12
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