发明名称 SENSOR DEVICE AND MOTION SENSOR
摘要 PROBLEM TO BE SOLVED: To provide a sensor device capable of reducing a thickness, a method for manufacturing this sensor device, a motion sensor using this sensor device, and a method for manufacturing this motion sensor.SOLUTION: A sensor device 1 includes: a silicon substrate 10; a first electrode 11 provided on an active surface 10a side of the silicon substrate 10; an external connection terminal 12 electrically connected to the first electrode 11 and provided on the active surface 10a side; a stress-relieving layer 15 provided between the silicon substrate 10 and the external connection terminal 12; a connection terminal 13 provided on the active surface 10a side of the silicon substrate 10; and a vibration gyro element 20 as a sensor element provided with a substrate 21, each vibration arm extended from the substrate 21, and an extraction electrode 29 as a connection electrode. The vibration gyro element 20 is held by the silicon substrate 10 by the connection between the extraction electrode 29 and the external connection terminal 12.
申请公布号 JP2014222233(A) 申请公布日期 2014.11.27
申请号 JP20140129277 申请日期 2014.06.24
申请人 SEIKO EPSON CORP 发明人 OTSUKI TETSUYA
分类号 G01C19/5628;H01L41/047;H01L41/053;H01L41/113;H01L41/23;H01L41/29;H01L41/313 主分类号 G01C19/5628
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