| 摘要 |
<p>A vaporizer of a deposition apparatus is provided to obtain the uniformity of the evaporated thin film and suppress the generation of the foreign material by supplying source material which completely is vaporized to a processing chamber. A vaporizer(16) of a deposition apparatus comprises: an inlet port(28) which is connected to an inward end, and in which the source material in liquid state is supplied; a first evaporation space(30) vaporizing the source material which is provided from the inlet port; a second evaporation space(31) being connected to the first evaporation space and having the small diameter compared to the first evaporation space; and an outlet port being connected to the second evaporation space and supplying vaporized source material to the processing chamber. The vaporizer of the deposition apparatus comprises: an outer heater(34) installed outside the first and second evaporation spaces; and an inner heater(35) installed at the inside center of the second evaporation space.</p> |
