发明名称 ウェーハの加工方法
摘要 The invention provides a method for processing a wafer by inserting the wafer into a holding hole of a carrier to hold the wafer, and interposing the carrier holding the wafer between an upper turn table and a lower turn table to process both surfaces of the wafer simultaneously, including: before processing the wafer, detecting a height position of the upper turn table by a laser displacement sensor while interposing the carrier holding the wafer between the upper turn table and the lower turn table; and determining that the wafer is not normally held to redo the holding of the wafer if a difference between the detected height position and a reference position exceeds a threshold. The method can automatically detect accurately a failure in holding the wafer before processing to prevent the wafer from breaking and eliminate the necessity of operator's inspection using touch to improve operation efficiency.
申请公布号 JP5630414(B2) 申请公布日期 2014.11.26
申请号 JP20110220143 申请日期 2011.10.04
申请人 信越半導体株式会社 发明人 菅野 伸哉
分类号 B24B37/34;H01L21/304 主分类号 B24B37/34
代理机构 代理人
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