发明名称 |
Two terminal resistive switching device structure and method of fabricating |
摘要 |
A method forms a two terminal device. The method includes forming a first dielectric material overlying a surface region of a substrate. A bottom wiring material is formed overlying the first dielectric material and a switching material is deposited overlying the bottom wiring material. The bottom wiring material and the switching material is subjected to a first patterning and etching process to form a first structure having a top surface region and a side region. The first structure includes at least a bottom wiring structure and a switching element having a first side region, and a top surface region including an exposed region of the switching element. A second dielectric material is formed overlying at least the first structure including the exposed region of the switching element. The method forms an opening region in a portion of the second dielectric layer to expose a portion of the top surface region of the switching element. A top wiring material including a conductive material is formed overlying at lease the opening region such that the conductive material is in direct contact with the switching element. A second etching process is performed to form at least a top wiring structure. In a specific embodiment, the side region of the first structure including a first side region of the switching element is free from a contaminant conductive material from the second etching process. |
申请公布号 |
EP2408035(A3) |
申请公布日期 |
2014.11.26 |
申请号 |
EP20110005649 |
申请日期 |
2011.07.11 |
申请人 |
CROSSBAR, INC. |
发明人 |
JO, SUNG HYUN;HERNER, SCOTT BRAD |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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