发明名称 |
Method and apparatus of forming a conductive layer |
摘要 |
The present invention generally includes an apparatus and process of forming a conductive layer on a surface of a host substrate, which can be directly used to form a portion of an electronic device. More specifically, one or more of the embodiments disclosed herein include a process of forming a conductive layer on a surface of a substrate using an electrospinning type deposition process. Embodiments of the conductive layer forming process described herein can be used to reduce the number of processing steps required to form the conductive layer, improve the electrical properties of the formed conductive layer and reduce the conductive layer formation process complexity over current state-of-the-art conductive layer formation techniques. Typical electronic device formation processes that can benefit from one or more of the embodiments described herein include, but are not limited to processes used to form solar cells, electronic visual display devices and touchscreen type technologies. |
申请公布号 |
US8895351(B2) |
申请公布日期 |
2014.11.25 |
申请号 |
US201213656485 |
申请日期 |
2012.10.19 |
申请人 |
Applied Materials, Inc. |
发明人 |
Leschkies Kurtis;Verhaverbeke Steven;Visser Robert |
分类号 |
H01L21/00;H01L31/0392;H01L31/0224 |
主分类号 |
H01L21/00 |
代理机构 |
Patterson & Sheridan, LLP |
代理人 |
Patterson & Sheridan, LLP |
主权项 |
1. A method of forming a conductive layer on a substrate, comprising:
depositing a metal salt containing polymeric material on a surface of the substrate; reducing a pressure in a processing region of a first processing chamber to a pressure less than 760 Torr; heating the substrate, which is disposed in the processing region, to a first temperature between about 25° C. and about 250° C.; and exposing the deposited metal salt containing polymeric material to an activated process gas delivered from a gas delivery device disposed in the processing region. |
地址 |
Santa Clara CA US |