发明名称 Photoelectric conversion device
摘要 A main object of the present invention is to provide a photoelectric conversion device which is capable of improving the photoelectric conversion efficiency. The invention comprises: a p-layer; an n-layer; an i-layer disposed between the p-layer and the n-layer; a first electrode connected to the p-layer; and a second electrode connected to the n-layer, wherein the i-layer comprises a wall layer constituted by a first semiconductor, and a quantum structure portion constituted by a second semiconductor disposed in the wall layer; a band gap of the first semiconductor is wider than that of the second semiconductor; when a concentration of the n-type impurity that may be contained in the middle of the i-layer in a thickness direction thereof is defined as Cn1, a concentration of the n-type impurity that may be contained in the region on the p-layer side of the i-layer is defined as Cn2, a concentration of the p-type impurity that may be contained in the middle of the i-layer in a thickness direction thereof is defined as Cp1, and a concentration of the p-type impurity that may be contained in the region on the n-layer side of the i-layer is defined as Cp2, the relations Cn1<Cn2 and/or Cp1<Cp2 are satisfied.
申请公布号 US8895840(B2) 申请公布日期 2014.11.25
申请号 US200913383489 申请日期 2009.07.23
申请人 Toyota Jidosha Kabushiki Kaisha 发明人 Suto Hiroyuki
分类号 H01L31/06;H01L31/02;H01L31/075;H01L31/0352 主分类号 H01L31/06
代理机构 Finnegan, Henderson, Farabow, Garrett &amp; Dunner, LLP 代理人 Finnegan, Henderson, Farabow, Garrett &amp; Dunner, LLP
主权项 1. A photoelectric conversion device comprising: a p-layer; an n-layer; an i-layer disposed between the p-layer and the n-layer, the i-layer comprising: a wall layer including a first semiconductor; anda quantum structure portion including a second semiconductor and disposed in the wall layer,wherein: a band gap of the first semiconductor is wider than a band gap of the second semiconductor,at least one of a first region on an n-layer side of the i-layer contains a p-type impurity or a second region on a p-layer side of the i-layer contains an n-type impurity,in a case where the first region contains the p-type impurity, a relation Cp1<Cp2 is satisfied, where Cp1 denotes a concentration of the p-type impurity at a middle of the i-layer in a thickness direction of the i-layer, and Cp2 denotes a concentration of the p-type impurity in the first region, andin a case where the second region contains the n-type impurity, a relation Cn1<Cn2 is satisfied, where Cn1 denotes a concentration of the n-type impurity at the middle of the i-layer in the thickness direction, and Cn2 denotes a concentration of the n-type impurity in the second region; a first electrode connected to the p-layer; a second electrode connected to the n-layer; and at least one of a first insulating layer disposed between the p-layer and the first electrode or a second insulating layer disposed between the n-layer and the second electrode.
地址 Toyota-shi, Aichi-ken JP